Products & Services


    
Test Wafers

    
Analysis Software

    
Metrology Service

    Defect Characterization
    & E-Testing Services

 


 

 



 Patterned Test Wafters For CMP Process Characterization

In order to investigate pattern dependency of CMP process, "standard" test patterned wafters are important to characterize CMP Process. In addition, besides planarity, defectivity evaluation become more critical. SKW provides various types of test patterned wafers for both planarity and defectivity evaluations.

Wafer Type Mask Features
Dielectric SKW 1-1 150mm
SKW1 200mm
SKW7-2 200mm
SKW 7-2HSH 200mm


Wafer Type Mask Features
STI SKW3-2 HDP CVD oxide film
SKW3-5 HDP CVD oxide film/ defectivity
SKW3-6 HDP CVD oxide film planarity & defectivity evaluation


Wafer Type Mask Features
W SKW5-2  
SKW5-3 Single damascene structure
SKW5PA (RAM 7) Plug patterned [plug size (0.2µm)]
SKW5PB (RAM 7) New! Plug patterned [plug size (0.15µm)]
SKW5-J085 New! Plug patterned [plug size (0.16µm)] for 90nm technology node
SKW 5-ICP-A (ATR30) New! 90nm technology
SKW 5-ICP-B (K194) New! 90nm technology


Wafer Type Mask Features
Poly Si SKW3AS 200mm
SKW3PS 200mm
SKW3PN 200mm
SKW3DPS New! 200mm


Wafer Type Mask Features
Cu SKW 6(C)-3.18 TEOS  
SKW 6(L)-3.18 BD  
SKW 6(L)-3.18 TEOS  
SKW 6-3.13 BD New! 90nm technology node
SKW 6-3.18 TN BD New!  
SKW 6-3.13 TEOS New! 90nm technology node
SKW 6-3.18 TN TEOS New!  
SKW 6-3.13 BD/SiON New! 90nm technology node
SKW 6-3.18 TN BD/SiON New!  
SKW 6-5 BD New! 90nm technology node
SKW 6-5 TEOS New! 90nm technology node
SKW 6-5 BD/SiON New! 90nm technology node


Wafer Type Mask Features
300mm SKW 7-2 New!  
SKW 3-2 New!  
SKW 3-2 C-6700-HDP New!  
SKW 3-5 New! Defectivity evaluation
SKW 3-6 New! Planarity and defectivity evaluation
SKW 5-3 New!  
SKW 6-3 BD New! Cu/Low-k
SKW 6-3 CORAL New! Cu/Low-k
SKW 6-3 TEOS New!  
SKW3-764ETC303 New! STI CMP Evaluation

 

 
 

SKW Associates, Inc.