Products & Services


    
Test Wafers

    
Analysis Software
    
> ChampiAn
    
> ChampiSim

    
Metrology Service

    Defect Characterization
    & E-Testing Services

 


 

 



ChampiAn
Ch
emical and Mechanical Polishing (CMP)
Data Management and Analysis Software

Analyzing data from a CMP process is often difficult and time consuming.

ChampiAn integrates these multiple development steps by reading and converting data from metrology tools into common formats, and by automating analysis tasks.

This lets the engineer concentrate on process development thereby saving considerable time and resources.

Features


• Full flexibility in designing experiments and analysing results
• Support both patterned and blanket wafers
• Compatibility with major metrology tools         (supported metrology tools)
• Automatic calculation of critical CMP metrics such as
- R
emoval rates
- Within-die and within-wafer non-uniformities
- Planarization length based on patterned wafer data
- Total metal loss
(details...)

• Hundreds of analysis results
• Easy data sharing between users
• Easy management of experimental data

Platform

• Windows 98
• Windows NT 4.0
• Windows 2000
• Solaris 2.6, 8
• Windows Me
• Windows XP


 
 

SKW Associates, Inc.