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ChampiAn
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ChampiSim
  Metrology
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  Defect
Characterization
  &
E-Testing
Services
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ChampiAn
Chemical
and Mechanical
Polishing
(CMP)
Data Management and Analysis Software |
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Analyzing
data from a CMP process is often difficult and time consuming.
ChampiAn
integrates these multiple development steps by reading and converting
data from metrology tools into common formats, and by automating
analysis tasks.
This lets the engineer concentrate on process development thereby
saving considerable time and resources.
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Features |
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Full flexibility in designing experiments and analysing results
Support both patterned and blanket wafers
Compatibility with major metrology tools (supported
metrology tools)
Automatic calculation of critical CMP metrics such as
- Removal
rates
- Within-die and within-wafer non-uniformities
- Planarization length based on patterned wafer data
- Total metal loss
(details...)
Hundreds of analysis results
Easy data sharing between users
Easy management of experimental data
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Platform |
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Windows 98
Windows NT 4.0
Windows 2000
Solaris 2.6, 8
Windows Me
Windows XP
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