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Products
& Services
Test
Wafers
Analysis
Software
>
ChampiAn
>
ChampiSim
Metrology
Service
Defect
Characterization
&
E-Testing
Services
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ChampiAn
Chemical
and Mechanical
Polishing
(CMP)
Data Management and Analysis Software |
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Analyzing
data from a CMP process is often difficult and time consuming.
ChampiAn
integrates these multiple development steps by reading and converting
data from metrology tools into common formats, and by automating
analysis tasks.
This lets the engineer concentrate on process development thereby
saving considerable time and resources.
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Features |
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• Full flexibility in designing experiments and analysing results
• Support both patterned and blanket wafers
• Compatibility with major metrology tools (supported
metrology tools)
• Automatic calculation of critical CMP metrics such as
- Removal
rates
- Within-die and within-wafer non-uniformities
- Planarization length based on patterned wafer data
- Total metal loss
(details...)
• Hundreds of analysis results
• Easy data sharing between users
• Easy management of experimental data
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Platform |
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Windows 98
• Windows NT 4.0
• Windows 2000
• Solaris 2.6, 8
• Windows Me
• Windows XP
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